Timely, authoritative, pedagogically consistent? a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications?especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
Die Inhaltsangabe kann sich auf eine andere Ausgabe dieses Titels beziehen.
MICHAEL A. LIEBERMAN, PhD, is Professor of Electrical Engineering at the University of California, Berkeley, and Director of the Berkeley Electronics Research Laboratory. He has published more than 140 journal articles on the topics of plasmas, plasma processing, and nonlinear dynamics. He has also published, with Professor Lichtenberg, Regular and Stochastic Motion and Regular and Chaotic Dynamics, Second Edition. ALLAN J. LICHTENBERG, PhD, is Professor of Electrical Engineering at the University of California, Berkeley. A respected pioneer in the fields of high-temperature plasmas, plasma discharges, and nonlinear dynamics, Dr. Lichtenberg has written over 100 articles in these areas. In addition to the books coauthored with Professor Lieberman, he has written an earlier monograph Phase Space Dynamics of Particles.
Timely, authoritative, pedagogically consistent a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low–pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.
„Über diesen Titel“ kann sich auf eine andere Ausgabe dieses Titels beziehen.
Anbieter: Better World Books, Mishawaka, IN, USA
Zustand: Very Good. Pages intact with possible writing/highlighting. Binding strong with minor wear. Dust jackets/supplements may not be included. Stock photo provided. Product includes identifying sticker. Better World Books: Buy Books. Do Good. Bestandsnummer des Verkäufers 13027564-6
Anzahl: 1 verfügbar
Anbieter: GoldBooks, Denver, CO, USA
Hardcover. Zustand: new. New Copy. Customer Service Guaranteed. Bestandsnummer des Verkäufers 58P76_89_0471005770
Anzahl: 1 verfügbar