This volume is devoted to consideration of the use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. Each chapter treats a type of film used in silicon devices and discusses typical problems seen throughout that film's history, including characterization tools which are most effectively used in clarifying and solving those problems.
Die Inhaltsangabe kann sich auf eine andere Ausgabe dieses Titels beziehen.
This volume is devoted to consideration of the use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. Each chapter treats a type of film used in silicon devices and discusses typical problems seen throughout that film's history, including characterization tools which are most effectively used in clarifying and solving those problems.
„Über diesen Titel“ kann sich auf eine andere Ausgabe dieses Titels beziehen.
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