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Resolution Enhancement Techniques in Optical Lithography (Tutorial Texts in Optical Engineering, V. Tt 47) - Softcover

Wong, Alfred Kwok-Kit

 
9780819439956: Resolution Enhancement Techniques in Optical Lithography (Tutorial Texts in Optical Engineering, V. Tt 47)
Softcover
ISBN 10: 0819439959 ISBN 13: 9780819439956
Verlag: SPIE Press, 2001

Inhaltsangabe

The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.

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Verlag
SPIE Press
Erscheinungsdatum
2001
Sprache
Englisch
ISBN 10 
0819439959
ISBN 13 
9780819439956
Einband
Taschenbuch
Anzahl der Seiten
214
Kontakt zum Hersteller
Nicht verfügbar
Verantwortliche Person
Mare Nostrum Group B.V.
gpsr@mare-nostrum.co.uk

Doelen 72
Breda
4831 GR
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