Handbook of Photomask Manufacturing Technology - Hardcover

Hardcover

ISBN 10: 0824753747 ISBN 13: 9780824753740

Verlag: CRC Press, 2005

Über diesen Titel

Reseña del editor

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available.

The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.

Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

Über diese Auflage

• Verlag: CRC Press
• Erscheinungsdatum: 2005
• ISBN 10: 0824753747
• ISBN 13: 9780824753740
• Einband: Tapa dura
• Auflage: 1
• Anzahl der Seiten: 728
• Herausgeber: Rizvi Syed