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Inhaltsangabe
This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.
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Reseña del editor
This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.
Reseña del editor
Proceedings of the Second Symposium held in Santa Clara, California, July 18-22, 1988
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- VerlagSpringer
- Erscheinungsdatum2011
- ISBN 10 146127852X
- ISBN 13 9781461278528
- EinbandTapa blanda
- SpracheEnglisch
- Anzahl der Seiten340
- HerausgeberMittal K.L.
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Zustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Proceedings of the Second Symposium held in Santa Clara, California, July 18-22, 1988 This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the. Bestandsnummer des Verkäufers 4190444
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Taschenbuch. Zustand: Neu. This item is printed on demand - Print on Demand Titel. Neuware -This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 340 pp. Englisch. Bestandsnummer des Verkäufers 9781461278528
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Particles on Surfaces 2 : Detection, Adhesion, and Removal
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Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles. Bestandsnummer des Verkäufers 9781461278528
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Particles on Surfaces 2: Detection, Adhesion, and Removal
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Taschenbuch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles. 340 pp. Englisch. Bestandsnummer des Verkäufers 9781461278528
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Particles on Surfaces 2: Detection, Adhesion, and Removal
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