The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 - Softcover

 
9781489915894: The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2

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Inhaltsangabe

Thermal Oxidation Mechanisms and Modeling: Silicon Oxides and Oxidation; A.M. Stoneham. Novel Oxidation Methods and Characterization: New Approach to Chemically Enhanced Oxidation; R.J. Jaccodine. Deposition and Properties of SiO2: Low Temperature Synthesis and Characterization of Silicon Dioxide Films; G.S. Chakravarthy, et al. Chemical Properties of Si Surfaces Related to Oxidation and Oxide Deposition: Pre-Gate Oxide Si Surface Control; M. Morita, T. Ohmi. Chemical, Structural, and Microroughness Effects at the SiSiO2 Interface: Dependence of Surface Microroughness on Types of Silicon Substrates; T. Ohmi, et al. Novel Structures, Processes, and Phenomena: Properties of Simox and Related Systems; S. Cristoloveanu, T. Ouisse. Defects and Hot-Carrier Induced Damage in SiSiO2 Systems: Radiation and Hydrogen Induced Effects in Silicon-Silicon Dioxide Systems. 56 additional articles. Index.

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9780306444197: The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2

Vorgestellte Ausgabe

ISBN 10:  0306444194 ISBN 13:  9780306444197
Verlag: Springer, 1993
Hardcover