Excerpt from Silicon Device Processing: Proceedings of a Symposium Held at Gaithersburg, Maryland, June 2-3, 1970
The 2oth anniversary of the development of the alloy junction, and the 15th anniversary of both commercial silicon devices and the founding of astm Committee F-l, was an appropriate time for this Symposium. Nbs welcomed the opportunity to cosponsor, with Committee F-l,.a meeting that should produce better understanding of both currently used and newer methods of silicon material characterization.
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Paperback. Zustand: New. Print on Demand. This book covers the measurement field in diffusion, epitaxy, surface preparation, and interdependence of unit processing operations. It explores the need and importance of current methods of measurement and introduces some new techniques to improve accuracy. The book identifies the shortcomings of available measurement techniques and emphasizes the importance of proper measurement to enhance device design and production. It presents a critical review of present characterization methods and discloses newer techniques with ample opportunity for discussion among the participants. The book discusses advancements in epitaxial growth methods, diffusion properties and techniques, and surface preparation and evaluation. It explores the impact of processing operations on device performance and reliability, providing valuable insights for engineers and scientists involved in silicon device processing. By highlighting the challenges and opportunities in measurement technology, this book contributes to the advancement of semiconductor device sciences and technologies. This book is a reproduction of an important historical work, digitally reconstructed using state-of-the-art technology to preserve the original format. In rare cases, an imperfection in the original, such as a blemish or missing page, may be replicated in the book. print-on-demand item. Bestandsnummer des Verkäufers 9781528123914_0
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