CVD Polymers: Fabrication of Organic Surfaces and Devices

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9783527337996: CVD Polymers: Fabrication of Organic Surfaces and Devices
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THE METHOD OF CVD (CHEMICAL VAPOR DEPOSITION) IS A VERSATILE TECHNIQUE TO FABRICATE HIGH–QUALITY THIN FILMS AND STRUCTURED SURFACES IN THE NANOMETER REGIME FROM THE VAPOR PHASE. ALREADY WIDELY USED FOR THE DEPOSITION OF INORGANIC MATERIALS IN THE SEMICONDUCTOR INDUSTRY, CVD HAS BECOME THE METHOD OF CHOICE IN MANY APPLICATIONS TO PROCESS POLYMERS AS WELL. THIS HIGHLY SCALABLE TECHNIQUE ALLOWS FOR SYNTHESIZING HIGH–PURITY, DEFECT–FREE FILMS AND FOR SYSTEMATICALLY TUNING THEIR CHEMICAL, MECHANICAL AND PHYSICAL PROPERTIES. IN ADDITION, VAPOR PHASE PROCESSING IS CRITICAL FOR THE DEPOSITION OF INSOLUBLE MATERIALS INCLUDING FLUOROPOLYMERS, ELECTRICALLY CONDUCTIVE POLYMERS, AND HIGHLY CROSSLINKED ORGANIC NETWORKS. FURTHERMORE, CVD ENABLES THE COATING OF SUBSTRATES WHICH WOULD OTHERWISE DISSOLVE OR SWELL UPON EXPOSURE TO SOLVENTS. THE SCOPE OF THE BOOK ENCOMPASSES CVD POLYMERIZATION PROCESSES WHICH DIRECTLY TRANSLATE THE CHEMICAL MECHANISMS OF TRADITIONAL POLYMER SYNTHESIS AND ORGANIC SYNTHESIS IN HOMOGENEOUS LIQUIDS INTO HETEROGENEOUS PROCESSES FOR THE MODIFICATION OF SOLID SURFACES. THE BOOK IS STRUCTURED INTO FOUR PARTS, COMPLEMENTED BY AN INTRODUCTORY OVERVIEW OF THE DIVERSE PROCESS STRATEGIES FOR CVD OF POLYMERIC MATERIALS. THE FIRST PART ON THE FUNDAMENTALS OF CVD POLYMERS IS FOLLOWED BY A DETAILED COVERAGE OF THE MATERIALS CHEMISTRY OF CVD POLYMERS, INCLUDING THE MAIN SYNTHESIS MECHANISMS AND THE RESULTANT CLASSES OF MATERIALS. THE THIRD PART FOCUSES ON THE APPLICATIONS OF THESE MATERIALS SUCH AS MEMBRANE MODIFICATION AND DEVICE FABRICATION. THE FINAL PART DISCUSSES THE POTENTIAL FOR SCALE–UP AND COMMERCIALIZATION OF CVD POLYMERS.

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The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.

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Karen K. Gleason is Associate Provost and the Alexander and I. Michael Kasser Professor of Chemical Engineering at MIT, USA. Her BSc and MSc degrees are from MIT and her PhD is from the University of California at Berkeley. Karen K. Gleason has authored more than 300 publications and holds 18 issued US patents for CVD polymers and their applications in optoelectronics, sensing, microfluidics, energy storage, and biomedical devices, and also for the surface modification of membranes. At MIT, she has served as Executive Officer of the Chemical Engineering Department; Associate Director for the Institute of Soldier Nanotechnologies; and as Associate Dean of Engineering for Research. She is a Member of the National Academy of Engineering, a Fellow of the American Institute of Chemical Engineering (AIChE) and has held the Donders Visiting Chair Professorship at Utrecht University in 2006. Her awards include the ID TechEx Printed Electronics Europe Best Technical Development Materials Award, the AIChE Process Development Research Award, and Young Investigator Awards from both the National Science Foundation and the Office of Naval Research.

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Buchbeschreibung Zustand: New. Publisher/Verlag: Wiley-VCH | Fabrication of Organic Surfaces and Devices | The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents.The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers. | List of Contributors XV1 Overview of Chemically Vapor Deposited (CVD) Polymers 1Karen K. Gleason1.1 Motivation and Characteristics 11.1.1 Quality 21.1.2 Conformality 21.1.3 Durability 31.1.4 Composition 31.2 Fundamentals and Mechanisms 41.2.1 Gas Phase and Surface Reactions 41.2.2 The Monomer Saturation Ratio 51.2.3 Process Simplification and Substrate Independence 61.3 Scale-Up and Commercialization 61.4 Process and Materials Chemistry 71.4.1 Initiated CVD (iCVD) and Its Variants 81.4.2 Plasma Enhanced CVD (PECVD) 81.4.3 Poly(p-xylylene) (PPX) and Its Derivatives ("Parylenes") 91.4.4 Oxidative CVD (oCVD) 91.4.5 Vapor Deposition Polymerization (VDP) and Molecular Layer Deposition (MLD) 91.4.6 Additional Methods 101.5 Summary 10Acknowledgments 11References 11Part I: Fundamentals 132 Growth Mechanism, Kinetics, and Molecular Weight 15Kenneth K. S. Lau2.1 Introduction 152.2 iCVD Process 162.3 Kinetics and Growth Mechanism 182.3.1 Fluorocarbon Polymers 182.3.2 Organosilicon Polymers 252.3.3 Acrylate and Methacrylate Polymers 282.3.4 Styrene and Other Vinyl Polymers 372.3.5 Ring Opening Polymers 372.4 Summary 39References 393 Copolymerization and Crosslinking 45Yu Mao3.1 Introduction 453.2 Copolymer Composition and Structure 463.2.1 Confirmation of iCVD Copolymerization 463.2.2 Analysis of Copolymer Composition 473.2.3 Compositional Gradient 503.3 Copolymerization Kinetics 523.3.1 Copolymerization Equation and Reactivity Ratio 523.3.2 Types of iCVD Copolymerization 553.4 Tunable Properties of iCVD Copolymers 563.4.1 Mechanical Properties 563.4.2 Swelling 583.4.3 Thermal Properties 603.4.4 Surface Properties 613.5 Conclusions 62References 624 Non-Thermal Initiation Strategies and Grafting 65Daniel D. Burkey4.1 Introduction 654.2 Initiation Strategies 654.2.1 Plasma Initiation Strategies 654.2.2 Photoinitiation Strategies 714.3 Grafting 764.3.1 Surface Modification of Organic Substrates 774.3.2 Surface Modification of Inorganic Substrates 784.3.3 Grafting Summary 824.4 Summary 82References 845 Conformal Polymer CVD 87Salmaan Baxamusa5.1 Introduction 875.2 Vapor Phase Transport 875.3 Conformal Polymer Coating Applications 885.4 Conformal Polymer Coating Technologies 895.5 Gas and Surface Reactions 905.6 The Reaction-Diffusion Model 93. Bestandsnummer des Verkäufers K9783527337996

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Buchbeschreibung Wiley VCH Verlag Gmbh Apr 2015, 2015. Buch. Zustand: Neu. Neuware - The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. 461 pp. Englisch. Bestandsnummer des Verkäufers 9783527337996

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Buchbeschreibung Wiley VCH Verlag Gmbh Apr 2015, 2015. Buch. Zustand: Neu. Neuware - The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. 461 pp. Englisch. Bestandsnummer des Verkäufers 9783527337996

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Buchbeschreibung Wiley VCH Verlag Gmbh Apr 2015, 2015. Buch. Zustand: Neu. Neuware - The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. 461 pp. Englisch. Bestandsnummer des Verkäufers 9783527337996

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Buchbeschreibung Wiley VCH Verlag Gmbh Apr 2015, 2015. Buch. Zustand: Neu. Neuware - The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents.The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers. 461 pp. Englisch. Bestandsnummer des Verkäufers 9783527337996

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