This book is proposed to develop an SOI (Silicon on Insulator) LDMOS in which a drift region of 1-¿m is added to a conventional n-MOS and compare them on various aspects. The drift region utilizes the RESURF effect that is utilized to distribute the electric field into the LDD region. It is found using two dimensional simulations that the addition of a drift region of 1-¿m in LDMOS improves the performance of the device in terms of breakdown-voltage and switching-speed over the conventional MOSFET.
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Arindam BiswasB.Tech, M.Tech (CU), PhD Submitted (NIT Dgp)Research Interests:Electron Transport, Non Linear Optics, Electron Devices.Publication: Journals and Conferences- 40 Book: 2
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Taschenbuch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book is proposed to develop an SOI (Silicon on Insulator) LDMOS in which a drift region of 1- m is added to a conventional n-MOS and compare them on various aspects. The drift region utilizes the RESURF effect that is utilized to distribute the electric field into the LDD region. It is found using two dimensional simulations that the addition of a drift region of 1- m in LDMOS improves the performance of the device in terms of breakdown-voltage and switching-speed over the conventional MOSFET. 84 pp. Englisch. Bestandsnummer des Verkäufers 9783659406751
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Zustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Biswas ArindamArindam BiswasB.Tech, M.Tech (CU), PhD Submitted (NIT Dgp)Research Interests:Electron Transport, Non Linear Optics, Electron Devices.Publication: Journals and Conferences- 40 Book: 2This book is proposed. Bestandsnummer des Verkäufers 5154233
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Taschenbuch. Zustand: Neu. This item is printed on demand - Print on Demand Titel. Neuware -This book is proposed to develop an SOI (Silicon on Insulator) LDMOS in which a drift region of 1-¿m is added to a conventional n-MOS and compare them on various aspects. The drift region utilizes the RESURF effect that is utilized to distribute the electric field into the LDD region. It is found using two dimensional simulations that the addition of a drift region of 1-¿m in LDMOS improves the performance of the device in terms of breakdown-voltage and switching-speed over the conventional MOSFET.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 84 pp. Englisch. Bestandsnummer des Verkäufers 9783659406751
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Taschenbuch. Zustand: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This book is proposed to develop an SOI (Silicon on Insulator) LDMOS in which a drift region of 1- m is added to a conventional n-MOS and compare them on various aspects. The drift region utilizes the RESURF effect that is utilized to distribute the electric field into the LDD region. It is found using two dimensional simulations that the addition of a drift region of 1- m in LDMOS improves the performance of the device in terms of breakdown-voltage and switching-speed over the conventional MOSFET. Bestandsnummer des Verkäufers 9783659406751
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Taschenbuch. Zustand: Neu. An SOI LDMOS For Better Switch Application | Electron Devices | Arindam Biswas (u. a.) | Taschenbuch | 84 S. | Englisch | 2013 | LAP LAMBERT Academic Publishing | EAN 9783659406751 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu. Bestandsnummer des Verkäufers 105909755
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