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Investigations on Magnetron Sputtered Titanium based Oxide Films: For Microelectronic Devices - Softcover

Musalikunta, Chandra Sekhar; Suda, Uthanna

 
9783659874819: Investigations on Magnetron Sputtered Titanium based Oxide Films: For Microelectronic Devices
Softcover
ISBN 10: 3659874817 ISBN 13: 9783659874819
Verlag: LAP LAMBERT Academic Publishing, 2016

Inhaltsangabe

The size reduction of Complementary Metal Oxide Semiconductor (CMOS) transistors requires replacement of conventional SiO2 layer with higher dielectric constant (k) material for gate dielectric, in order to reduce the gate leakage current and also to maximize gate capacitance. Among the many possible transition- metal oxide materials, titanium dioxide (TiO2) is a potential candidate because of its high energy band gap, refractive index and dielectric constant.

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Über die Autorin bzw. den Autor

He received the B.Sc. degree with First Class from Sri Venkateswara University, Tirupati, India in 2001 and the M.S. and Ph.D. degrees from the Sri Venkateswara University, Tirupati, in 2005 and 2012, respectively. In 2012, Dr. M. Chandra Sekhar joined the Department of Physics, Madanapalle Institute of Technology & Science, Madanapalle, India.

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Verlag
LAP LAMBERT Academic Publishing
Erscheinungsdatum
2016
Sprache
Englisch
ISBN 10 
3659874817
ISBN 13 
9783659874819
Einband
Taschenbuch
Anzahl der Seiten
180
Kontakt zum Hersteller
Nicht verfügbar
Verantwortliche Person
Fastbook Publishing
customerservice@vdm-vsg.de

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Riga
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