Flux Profile Modeling using Monte Carlo Simulation: A simulation tool for deposition processess using Molecular Beam Epitaxy - Softcover

Vijayagopal, Ramprasad; Venkat, Rama

Softcover

ISBN 10: 3838369386 ISBN 13: 9783838369389

Verlag: LAP LAMBERT Academic Publishing, 2010

Inhaltsangabe

Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.

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Über die Autorin bzw. den Autor

R. Vijayagopal received his masters degree in electrical engineering from the University of Nevada in 2004 and the University of Minnesota in 2006. His graduate thesis work at the University of Nevada has been presented in this book. He performed this work under guidance from Dr.Rama Venkat.

Details zur Ausgabe

• Verlag: LAP LAMBERT Academic Publishing
• Erscheinungsdatum: 2010
• Sprache: Englisch
• ISBN 10: 3838369386
• ISBN 13: 9783838369389
• Einband: Taschenbuch
• Anzahl der Seiten: 104
• Kontakt zum Hersteller: Nicht verfügbar
• Verantwortliche Person: SIA OmniScriptum Publishing; customerservice@vdm-vsg.de; ; Brivibas gatve 197; Riga; 1039; Lettland