Photoresist Technology in Microsystems: Principles, Processes and Applications (Springer Series in Advanced Microelectronics, 15) - Hardcover

Wang, Kaiying

Hardcover

ISBN 10: 9819516056 ISBN 13: 9789819516056

Verlag: Springer, 2025

Inhaltsangabe

This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components.  As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements.

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Über die Autorin bzw. den Autor

Prof. Kaiying Wang received his PhD in condensed matter physics from the Institute of Physics, Chinese Academy of Sciences. He joined University of South-Eastern Norway (USN) in 2007 as an associate professor and was promoted to professor in 2010. His research interests focus on micro-fabrication and nanotechnology, electrochemistry, photochemistry and nanodevices for environment and energy applications.

For teaching, he has taught the microfabrication (MFA4000, master) and Nanotechnology (TSE3120, bachelor) at University of South-eastern Norway from year 2010. Meanwhile, he has participated in several national and European projects related to the micro/nano fabrication technology. The related education programmes at USN include: (1) Sensor Systems and Innovation (2) Smart Systems Integrated Solutions (3) Micro- and Nano Systems Technology.

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This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components.  As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements.

Details zur Ausgabe

• Verlag: Springer
• Erscheinungsdatum: 2025
• Sprache: Englisch
• ISBN 10: 9819516056
• ISBN 13: 9789819516056
• Einband: Gebundene Ausgabe
• Anzahl der Seiten: 195
• Kontakt zum Hersteller: Springer Nature Customer Service Center GmbH; ProductSafety@springernature.com; ; Europaplatz 3; Heidelberg; 69115; Deutschland