PROJECT ON Elements of Modern Physics - Softcover

DAS, DIPAN KUMAR; DAS, SUDIP KUMAR

 
9798389987968: PROJECT ON Elements of Modern Physics

Inhaltsangabe

PROJECT ON Elements of Modern Physics
Ion implantation is a common technique used in the semiconductor industry for introducing dopants into a substrate to alter its electrical and physical properties. The success of this technique depends on the accurate modeling of the ion implantation process. SRIM (Stopping and Range of Ions in Matter) is a widely used simulation software for predicting ion implantation behavior in materials. In this project, we will use SRIM to simulate the ion implantation process and analyze its effects on a silicon substrate.IRADINA SOFTWARE also used for Ion implantation.

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