Apparel Design Through Patternmaking is a fresh design-oriented flat patternmaking text that gives fashion students a new perspective on patternmaking knowledge and skills they need to develop contemporary women’s, men’s, and children’s wear. This book covers a comprehensive range of concepts in flat pattern drafting, such as fit, style, and design development, and the modular approach allows for flexible design options across age, gender, and size, as reflected in current fashion trends. 200 detailed principles address proper measurements; body shapes; dart manipulation; neckline, collar, and sleeve variations; fit issues and corrections; garment details; and more, all of which are easily visualized with hundreds of line drawings and photos. Reference size charts and a decimal conversion chart included in the Appendix make this text user-friendly for international students.
Key Features:
- 20 slopers, 30 foundations, and variations
- 220 detailed principles of patternmaking
- 100+ applied garment designs
- A chapter on Cut & Sew stretch fabrics
- Learning objectives with clear flat sketches in each chapter
- A decimal conversion chart, reference size charts, and glossary of key terms
STUDIO Features Include:
- Watch videos that show the development process for customized sloper sets
- Review concepts with flashcards of essential vocabulary
- Practice with additional 1/2 scale slopers
Instructor Resources Include:
- Instructor's Guide provides suggestions for planning the course and using the text in the classroom, supplemental assignments, and lecture notes
Injoo Kim is a Full Professor in the Fashion Design Program at the University of Cincinnati, USA. Her research focuses on apparel product development across age and gender to improve the user experience and their environments, as well as the exploration of knitting methodologies to enhance the wearability of apparel. Her pedagogical research focuses on sustainable fashion including inclusive and ethical design. She has worked in the fashion industry in Seoul, Tokyo, and New York. Professor Kim has co-authored five books including Apparel Making in Fashion Design (Fairchild Books, 2002), Machine Knitting (Prentice Hall, 2006), Apparel Design through Patternmaking (Fairchild Books, 2022), and Patternmaking for Menswear: Classic to Contemporary (Fairchild Books, 2025).
Myoungok Kim is an Assistant Professor in the Fashion Design Program at the University of Cincinnati, USA. Professor Kim has over 20 years of fashion industry and educational experience. She investigates and enhances human experiences through exploratory design methodologies. Her scholarly work values design methodology and wearable technology, including 2D and 3D digital fashion and smart garments/devices. She has collaborated on many interdisciplinary research projects to create wearable garments/devices with design, engineering, and medical scholars and has published multiple journal articles and two books, including Patternmaking for Menswear: Classic to Contemporary (Fairchild Books, 2025) and Apparel Design through Patternmaking (Fairchild Books, 2022).
Zachary Hoh is an Assistant Professor of Practice at the University of Cincinnati. Professor Hoh has more than 10 years of industry and teaching experience spanning the design process including specialization in design and product development, technical design, and production. Professor Hoh teaches design methodology courses at the University and encourages students to employ pattern making and draping techniques creatively as three-dimensional, experimental design development tools.
