Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing (Woodhead Publishing Series in Electronic and Optical Materials)

Roel Gronheid, Paul Nealey

ISBN 10: 0081002505 / ISBN 13: 9780081002506

Verlag: Woodhead Publishing Ltd 2015-08-03, 2015

Beschreibung

Bestandsnummer des Verkäufers 6666-ELS-9780081002506

Bibliografische Details

• Titel: Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing (Woodhead Publishing Series in Electronic and Optical Materials)
• Verlag: Woodhead Publishing Ltd 2015-08-03
• Erscheinungsjahr: 2015
• Sprache: Englisch
• ISBN-10: 0081002505
• ISBN-13: 9780081002506
• Einband: Hardcover
• Zustand: New

Über diesen Titel

Inhaltsangabe

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

Von der hinteren Coverseite

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of semiconductor nanostructures reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.

Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.