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Brand New, Unread Copy in Perfect Condition. A+ Customer Service! Summary: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing. Buchnummer des Verkäufers

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Inhaltsangabe: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

Inhaltsangabe: This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing.

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1.

A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. Brader
Verlag: Plenum Press c1991., New York (1991)
ISBN 10: 0306438356 ISBN 13: 9780306438356
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Buchbeschreibung Plenum Press c1991., New York, 1991. Hardcover. Buchzustand: Very Good. Zustand des Schutzumschlags: No Dust Jacket. Corners bent; Large 8vo 9" - 10" tall; 237 pages. Buchnummer des Verkäufers 3470

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A. J. Van Roosmalen
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Buchbeschreibung Springer Science+Business Media, 1991. HRD. Buchzustand: New. New Book. Delivered from our US warehouse in 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Buchnummer des Verkäufers I1-9780306438356

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Roosmalen, A. J. Van/ Baggerman, J. A. G./ Brader, S. J. H.
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Buchbeschreibung Springer Verlag, 1991. HRD. Buchzustand: New. New Book. Shipped from US within 10 to 14 business days. Established seller since 2000. Buchnummer des Verkäufers KS-9780306438356

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A. J. Van Roosmalen
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Buchbeschreibung Springer Science+Business Media, 1991. HRD. Buchzustand: New. New Book. Shipped from US within 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Buchnummer des Verkäufers I1-9780306438356

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Roosmalen, A. J. Van; Van Roosmalen, A. J.; Baggerman, J. a. G.
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Buchbeschreibung Springer, 1991. Buchzustand: New. This item is printed on demand for shipment within 3 working days. Buchnummer des Verkäufers LP9780306438356

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A.J. VAN ROOSMALEN
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Buchbeschreibung Springer, 1991. Hardback. Buchzustand: NEW. 9780306438356 This listing is a new book, a title currently in-print which we order directly and immediately from the publisher. Buchnummer des Verkäufers HTANDREE0269387

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A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. Brader
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Buchbeschreibung Springer Science+Business Media, United States, 1991. Hardback. Buchzustand: New. 1991 ed.. 259 x 180 mm. Language: English . Brand New Book. This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing. Buchnummer des Verkäufers AAS9780306438356

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Roosmalen, A. J. Van
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Buchbeschreibung Springer, 2016. Paperback. Buchzustand: New. PRINT ON DEMAND Book; New; Publication Year 2016; Not Signed; Fast Shipping from the UK. No. book. Buchnummer des Verkäufers ria9780306438356_lsuk

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A. J. van Roosmalen, J. A. G. Baggerman, S. J. H. Brader
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Buchbeschreibung Springer Science+Business Media, United States, 1991. Hardback. Buchzustand: New. 1991 ed.. 259 x 180 mm. Language: English . Brand New Book. This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing. Buchnummer des Verkäufers AAS9780306438356

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A.J. van Roosmalen/ J.A.G. Baggerman/ S.J.H. Brader
Verlag: Plenum Pub Corp (1991)
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Buchbeschreibung Plenum Pub Corp, 1991. Hardcover. Buchzustand: Brand New. 1st edition. 252 pages. 10.25x7.00x0.75 inches. In Stock. Buchnummer des Verkäufers z-0306438356

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