ISBN 10: 0470625953 / ISBN 13: 9780470625958
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This Book is in Good Condition. Clean Copy With Light Amount of Wear. 100% Guaranteed. Summary: This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. Buchnummer des Verkäufers

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Inhaltsangabe: This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing.

From the Reviews...

"This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment."
Randy Wallace, Department Head, Discovery Park Library, University of North Texas

From the Back Cover:

Provides an In-depth discussion of surface conditioning for semiconductor applications

The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching.

Topics covered in this new reference include:

  • Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation

  • Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling

  • Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features

  • The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid

The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.

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Verlag: John Wiley and#38; Sons (2011)
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Buchbeschreibung John Wiley and#38; Sons, 2011. HRD. Buchzustand: New. New Book. Shipped from UK in 4 to 14 days. Established seller since 2000. Buchnummer des Verkäufers FW-9780470625958

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Verlag: John Wiley and Sons Ltd, United Kingdom (2011)
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Buchbeschreibung John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Buchzustand: New. Language: English . Brand New Book. This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews. This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment. Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Buchnummer des Verkäufers AAH9780470625958

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Verlag: John Wiley and Sons Ltd, United Kingdom (2011)
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Buchbeschreibung John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Buchzustand: New. Language: English . Brand New Book. This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews. This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment. Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Buchnummer des Verkäufers AAH9780470625958

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Karen A. Reinhardt
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Buchbeschreibung John Wiley and#38; Sons, 2011. HRD. Buchzustand: New. New Book.Shipped from US within 10 to 14 business days.THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Buchnummer des Verkäufers IP-9780470625958

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Buchbeschreibung John Wiley and#38; Sons, 2011. HRD. Buchzustand: New. New Book. Delivered from our US warehouse in 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND.Established seller since 2000. Buchnummer des Verkäufers IP-9780470625958

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Buchbeschreibung Wiley-Scrivener, 2011. Hardcover. Buchzustand: New. book. Buchnummer des Verkäufers 0470625953

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Buchbeschreibung John Wiley and Sons Ltd. Hardback. Buchzustand: new. BRAND NEW, Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications, Karen A. Reinhardt, Richard F. Reidy, This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews."This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." -Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Buchnummer des Verkäufers B9780470625958

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Buchbeschreibung Wiley-Scrivener, 2011. Buchzustand: new. Shiny and new! Expect delivery in 2-3 weeks. Buchnummer des Verkäufers 9780470625958-1

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Karen A. Reinhardt (Editor), Richard F. Reidy (Editor)
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Buchbeschreibung Wiley-Scrivener, 2011. Hardcover. Buchzustand: New. 1. Buchnummer des Verkäufers DADAX0470625953

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Verlag: Wiley-Scrivener (2017)
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Buchbeschreibung Wiley-Scrivener, 2017. Hardcover. Buchzustand: New. This item is printed on demand. Buchnummer des Verkäufers 0470625953

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