HfO2-Based Ferroelectric Materials (Hardcover)

Sprache: Englisch

Verlag: Wiley-VCH Verlag GmbH, Berlin, 2026

3527353186 / 9783527353187

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Artikelbeschreibung des Verkäufers

Hardcover. Explores HfO2-based ferroelectrics for memory, sensing, and advanced electronic applications Ferroelectric hafnium oxide (HfO2)-based materials have transformed the field of electronic materials and device design, offering pathways to overcome long-standing barriers in scalability, compatibility, and reliability. The emergence of robust ferroelectricity in doped HfO2 has revolutionized both research and industry perspectives, providing a viable solution where conventional ferroelectrics often fell short. With contributions from leading experts, HfO2-Based Ferroelectric Materials addresses the critical need for a consolidated reference on HfO2-based ferroelectrics, offering foundational knowledge as well as the latest insights into fabrication, material characterization, and device integration. The book opens with fundamentals of ferroelectricity and the mechanisms driving HfO2-based ferroelectric behavior, before progressing to detailed examinations of deposition techniques, superlattice structures, and reliability considerations. It further explores a broad spectrum of applications, including non-volatile memories, neuromorphic computing, compute-in-memory architectures, and negative capacitance transistors, alongside emerging roles in energy storage, microwave technologies, and piezoelectric systems. Special attention is given to persistent challengessuch as the wake-up effect, fatigue, and imprint issuesand the strategies developed to mitigate them. An authoritative and well-structured resource for advancing the frontiers of electronic materials and device technologies, HfO2-Based Ferroelectric Materials: Explains the origins of ferroelectricity in doped HfO2 and its unique material advantagesDetails deposition techniques and approaches to regulating ferroelectric behaviorExamines device-level challenges, including wake-up effect, fatigue, and imprint reliabilityHighlights applications spanning non-volatile memories, neuromorphic computing, and energy-efficient devicesDiscusses advanced designs such as superlattice-like laminate structures and 3D ferroelectric memoriesProvides insight into the reliability of HfO2-based thin films, capacitors, and field-effect transistors HfO2-Based Ferroelectric Materials: Fabrication, Characterization, and Device Applications is an essential resource for materials scientists, electronics engineers, semiconductor and solid-state physicists, and professionals in the semiconductor and sensor industries. It is also a valuable reference for graduate-level courses in electronic materials, semiconductor devices, and advanced nanotechnology within physics, materials science, and electrical engineering degree programs. This item is printed on demand. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability. …

Bestandsnummer des Verkäufers 9783527353187

Titel
HfO2-Based Ferroelectric Materials (Hardcover)
Autor
Xubing Lu
Verlag
Wiley-VCH Verlag GmbH, Berlin
Erscheinungsjahr
2026
Zustand
new
Einband
Hardcover
Sprache
Englisch
ISBN-10
3527353186
ISBN-13
9783527353187

AussieBookSeller

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