Relational Data Clustering: Models, Algorithms, and Applications (Chapman & Hall/CRC Data Mining and Knowledge Discovery)

Long, Bo; Zhang, Zhongfei; Yu, Philip S.

ISBN 10: 1420072617 / ISBN 13: 9781420072617

Verlag: Chapman and Hall/CRC, 2010

Beschreibung

Bestandsnummer des Verkäufers ABLIING23Mar2411530197735

Bibliografische Details

Titel: Relational Data Clustering: Models, ...

Verlag: Chapman and Hall/CRC

Erscheinungsdatum: 2010

Einband: Hardcover

Zustand: New

Über diesen Titel

Inhaltsangabe:

A culmination of the authors’ years of extensive research on this topic, Relational Data Clustering: Models, Algorithms, and Applications addresses the fundamentals and applications of relational data clustering. It describes theoretic models and algorithms and, through examples, shows how to apply these models and algorithms to solve real-world problems.

After defining the field, the book introduces different types of model formulations for relational data clustering, presents various algorithms for the corresponding models, and demonstrates applications of the models and algorithms through extensive experimental results. The authors cover six topics of relational data clustering:

1. Clustering on bi-type heterogeneous relational data



2. Multi-type heterogeneous relational data



3. Homogeneous relational data clustering



4. Clustering on the most general case of relational data



5. Individual relational clustering framework



6. Recent research on evolutionary clustering

This book focuses on both practical algorithm derivation and theoretical framework construction for relational data clustering. It provides a complete, self-contained introduction to advances in the field.

Über die Autorin bzw. den Autor:

Bo Long is a scientist at Yahoo! Labs in Sunnyvale, California.

Zhongfei Zhang is an associate professor in the computer science department at the State University of New York in Binghamton.

Philip S. Yu is a professor in the computer science department and the Wexler Chair in Information Technology at the University of Illinois in Chicago.