Sputtering by Particle Bombardment | Experiments and Computer Calculations from Threshold to MeV Energies

Rainer Behrisch (u. a.)

ISBN 10: 3540445005 / ISBN 13: 9783540445005

Verlag: Springer, 2007

Beschreibung

Sputtering by Particle Bombardment | Experiments and Computer Calculations from Threshold to MeV Energies | Rainer Behrisch (u. a.) | Buch | Topics in Applied Physics | xvii | Englisch | 2007 | Springer | EAN 9783540445005 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.

Bestandsnummer des Verkäufers 112012534

Bibliografische Details

• Titel: Sputtering by Particle Bombardment | Experiments and Computer Calculations from Threshold to MeV Energies
• Verlag: Springer
• Erscheinungsjahr: 2007
• Sprache: Englisch
• ISBN-10: 3540445005
• ISBN-13: 9783540445005
• Einband: Buch
• Zustand: Neu
• Abmessungen: 241B x 160 H x 34 T Millimeter Breite: 241 mm, Höhe: 160 mm, Tiefe: 34 mm
• Gewicht: 951 Gramm
• Verkäuferkataloge:
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Über diesen Titel

Inhaltsangabe

Earlier books on this subject, i.e. "Sputtering by Particle Bombardment I - III" are nearly 20 years old, but since then a lot of new and important work has been performed and published in international journals. The planned book brings an overview about all the new results. This concerns especially a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields. This is especially useful for all colleagues, who need sputtering yields for physics and/or applied problems. The computational methods for calculating sputtering yields are critically reviewed, Molecular dynamics calculations have not been covered in the previous books on sputtering. The influence of chemical effects on sputtering and the new models developed in the last years for understanding these effects, such as for hydrogen ion bombardment of carbon, are outlined. New developments, such as sputtering by MeV Ions and the mechanisms for understanding the effects are presented. The new results about the angular and energy distributions of sputtered atoms are presented in an extra chapter.

Von der hinteren Coverseite

This volume gives a comprehensive overview about the physical processes causing sputtering of solids at bombardment with energetic ions. The most important quantities are the sputtering yields, i.e. the average number of atoms eroded per incident ion. The latest results for the sputtering yields and their dependence on the incident energy and angle of incidence, as well as the energy and angular distributions of the sputtered atoms are presented. This concerns experimentally determined yields as well as a critical evaluation of the computational methods used to calculate the yields and distributions. The energies of the incident ions cover the range between a few eV up to several MeV. The influence of chemical effects between the incident ions and the atoms of the bombarded solid on the sputtering yields are also reviewed.