Tantalum Oxide Thin Films for Embedded Capacitors: Using Pulsed DC Reactive Sputtering

Jain, Pushkar

ISBN 10: 3639096622 / ISBN 13: 9783639096620

Verlag: VDM Verlag, 2008

In. Bestandsnummer des Verkäufers ria9783639096620_new

Inhaltsangabe:

Embedded capacitor technology, where thin filmcapacitors are integrated at on-chip and/or off-chiplevels, offers high packaging densities and improvedelectrical performance at potentially reduced costsof capacitor fabrication and integration. Thisresearch explores and establishes the leverages ofusing thin film embedded capacitors over currentlyused surface mount discrete capacitors. Inparticular, this work focuses on developing pulseddc reactively sputtered tantalum oxide (Ta2O5) thinfilm capacitors for IC chips and packages. A designspace for breakdown voltage and capacitance densityof planar capacitors is established, with filmthickness and material dielectric constant asparameters. The validity of the developed designspace is experimentally verified with Ta2O5 thinfilms over a wide range of film thickness. Anexperimentally verified analytical model for pulseddc reactive sputtering of Ta2O5 films is describedand evaluated. Various processing and integrationchallenges in depositing thin films using reactivesputtering and their effects on electricalperformance of thin-film capacitors are discussed.

Bibliografische Details

Titel: Tantalum Oxide Thin Films for Embedded ...
Verlag: VDM Verlag
Erscheinungsdatum: 2008
Einband: Softcover
Zustand: New