ISBN: 9783540714903 - advanced gate stacks for high-mobility semiconductors (springer series in advanced microelectronics, 27, band 27) (13 Ergebnisse)

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Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - Strained-Si CMOS Technology.- High Current Drivability MOSFET Fabricated on Si(110) Surface.- Advanced High-Mobility Semiconductor-on-Insulator Materials.- Passivation and Characterization of Germanium Surfaces.- Interface Engineering for High- Ge MOSFETs.- Effect of Surface Nitridation on the Electrical Characteristics of Germanium High- /Metal Gate Metal-Oxide-Semiconductor Devices.- Modeling of Growth of High- Oxides on Semiconductors.- Physical, Chemical, and Electrical Characterization of High- Dielectrics on Ge and GaAs.- Point Defects in Stacks of High- Metal Oxides on Ge: Contrast with the Si Case.- High Gate Dielectrics for Compound Semiconductors.- Interface Properties of High- Dielectrics on Germanium.- A Theoretical View on the Dielectric Properties of Crystalline and Amorphous High- Materials and Films.- Germanium Nanodevices and Technology.- Opportunities and Challenges of Germanium Channel MOSFETs.- Germanium Deep-Submicron p-FET and n-FET Devices, Fabricated on Germanium-On-Insulator Substrates.- Processing and Characterization of III-V Compound Semiconductor MOSFETs Using Atomic Layer Deposited Gate Dielectrics.- Fabrication of MBE High- MOSFETs in a Standard CMOS Flow.…

Zustand: Sehr gut. Zustand: Sehr gut | Seiten: 408 | Sprache: Englisch | Produktart: Bücher | This book provides a comprehensive monograph on gate stacks in semiconductor technology. It covers the major latest developments and basics and will be useful as a reference work for researchers, engineers and graduate students alike. The reader will get a clear view of what has been done so far, what is the state-of-the-art and which are the main challenges ahead before we come any closer to a viable Ge and III-V MOS technology.…

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Zustand: New. Brand New! Fast Delivery This is an International Edition and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 6-10 days and we do have flat rate for up to 2LB. Extra shipping charges will be requested if the Book weight is more than 5 LB. This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.…

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Buch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book provides a comprehensive monograph on gate stacks in semiconductor technology. It covers the major latest developments and basics and will be useful as a reference work for researchers, engineers and graduate students alike. The reader will get a clear view of what has been done so far, what is the state-of-the-art and which are the main challenges ahead before we come any closer to a viable Ge and III-V MOS technology. 408 pp. Englisch.…

Gebunden. Zustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Comprehensive monograph on gate stacks in semiconductor technologyCovers the major latest developments and basicsA reference work for researchers, engineers and graduate students alikeDr. Dimoulas obtained his Ph.D in Applied Phy.…

Buch. Zustand: Neu. This item is printed on demand - Print on Demand Titel. Neuware -This book provides a comprehensive monograph on gate stacks in semiconductor technology. It covers the major latest developments and basics and will be useful as a reference work for researchers, engineers and graduate students alike. The reader will get a clear view of what has been done so far, what is the state-of-the-art and which are the main challenges ahead before we come any closer to a viable Ge and III-V MOS technology.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 408 pp. Englisch.…