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Verlag: Plenum Press;, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: books4less (Versandantiquariat Petra Gros GmbH & Co. KG), Welling, Deutschland
Buch
Gebundene Ausgabe, Zustand: Gut. 237 Seiten; Das hier angebotene Buch stammt aus einer teilaufgelösten wissenschaftlichen Bibliothek und trägt die entsprechenden Kennzeichnungen (Rückenschild, Instituts-Stempel.); Schnitt und Einband sind etwas staubschmutzig; der Buchzustand ist ansonsten ordentlich und dem Alter entsprechend gut. Text in ENGLISCHER Sprache! Sprache: Englisch Gewicht in Gramm: 630.
Verlag: Springer, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: BennettBooksLtd, North Las Vegas, NV, USA
Buch
Zustand: New. New. In shrink wrap. Looks like an interesting title! 1.4.
Verlag: Springer, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: booksXpress, Bayonne, NJ, USA
Buch
Hardcover. Zustand: new.
Verlag: Springer, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: Lucky's Textbooks, Dallas, TX, USA
Buch
Zustand: New.
Verlag: Springer, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
Buch Print-on-Demand
Zustand: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book.
Verlag: Springer US Mrz 1991, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Deutschland
Buch Print-on-Demand
Buch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing. 260 pp. Englisch.
Verlag: Springer US, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: moluna, Greven, Deutschland
Buch Print-on-Demand
Gebunden. Zustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in t.
Verlag: Springer US, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Buch
Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Verlag: Springer, 1991
ISBN 10: 0306438356ISBN 13: 9780306438356
Anbieter: Mispah books, Redhill, SURRE, Vereinigtes Königreich
Buch
Hardcover. Zustand: Like New. Like New. book.