Simulation of Deposition Processes With PECVD Apparatus: Theory and Applications (Materials Science and Technologies) - Hardcover

 
9781621003656: Simulation of Deposition Processes With PECVD Apparatus: Theory and Applications (Materials Science and Technologies)
Hardcover
ISBN 10: 1621003655 ISBN 13: 9781621003656
Verlag: Nova Science Publishers Inc, 2012

Inhaltsangabe

This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.

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Verlag
Nova Science Publishers Inc
Erscheinungsdatum
2012
Sprache
Englisch
ISBN 10 
1621003655
ISBN 13 
9781621003656
Einband
Gebundene Ausgabe
Anzahl der Seiten
144
Herausgeber
Geiser Jurgen, Arab Meraa
Kontakt zum Hersteller
Nicht verfügbar
Verantwortliche Person
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Pärnu mnt 139b-14
Tallinn
11317
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