The Drift Diffusion Equation and Its Applications in MOSFET Modeling (Computational Microelectronics) - Softcover

Buch 6 von 17: Computational Microelectronics

Hänsch, Wilfried

 
9783709190975: The Drift Diffusion Equation and Its Applications in MOSFET Modeling (Computational Microelectronics)
Softcover
ISBN 10: 3709190975 ISBN 13: 9783709190975
Verlag: Springer, 2011

Inhaltsangabe

To be perfect does not mean that there is nothing to add, but rather there is nothing to take away Antoine de Saint-Exupery The drift-diffusion approximation has served for more than two decades as the cornerstone for the numerical simulation of semiconductor devices. However, the tremendous speed in the development of the semiconductor industry demands numerical simulation tools that are efficient and provide reliable results. This makes the development of a simulation tool an interdisciplinary task in which physics, numerical algorithms, and device technology merge. For the sake of an efficient code there are trade-offs between the different influencing factors. The numerical performance of a program that is highly flexible in device types and the geometries it covers certainly cannot compare with a program that is optimized for one type of device only. Very often the device is sufficiently described by a two­ dimensional geometry. This is the case in a MOSFET, for example, if the gate length is small compared with the gate width. In these cases the geometry reduces to the specification of a two-dimensional device. Here again the simplest geometries, which are planar or at least rectangular surfaces, will give the most efficient numerical codes. The device engineer has to decide whether this reduced description of the real device is still suitable for his purposes.

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Reseña del editor

To be perfect does not mean that there is nothing to add, but rather there is nothing to take away Antoine de Saint-Exupery The drift-diffusion approximation has served for more than two decades as the cornerstone for the numerical simulation of semiconductor devices. However, the tremendous speed in the development of the semiconductor industry demands numerical simulation tools that are efficient and provide reliable results. This makes the development of a simulation tool an interdisciplinary task in which physics, numerical algorithms, and device technology merge. For the sake of an efficient code there are trade-offs between the different influencing factors. The numerical performance of a program that is highly flexible in device types and the geometries it covers certainly cannot compare with a program that is optimized for one type of device only. Very often the device is sufficiently described by a two­ dimensional geometry. This is the case in a MOSFET, for example, if the gate length is small compared with the gate width. In these cases the geometry reduces to the specification of a two-dimensional device. Here again the simplest geometries, which are planar or at least rectangular surfaces, will give the most efficient numerical codes. The device engineer has to decide whether this reduced description of the real device is still suitable for his purposes.

Reseña del editor

The drift diffusion equation and its applications in MOSFET modeling will bridge the gap between phe-nomenological modeling and a rigorous microscopic approach. The five chapters cover: Wigner's and Boltzmann's equation, the relaxation time approximation and the hydro dynamic equations for the case of strong non equilibrium, charge transport in an inversion channel, analytical approaches to determine the high energy distribution of carriers in high electric fields, and the spatial and temporal built up of charges in the gate oxide of a MOSFET device under electrical stress.

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Verlag
Springer
Erscheinungsdatum
2011
Sprache
Englisch
ISBN 10 
3709190975
ISBN 13 
9783709190975
Einband
Tapa blanda
Anzahl der Seiten
288
Kontakt zum Hersteller
Nicht verfügbar
Verantwortliche Person
CMN Printpool Inh. Mathis Neumann
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