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In den WarenkorbZustand: New. pp. xxviii + 308.
Zustand: New. pp. xxviii + 308 Index.
Zustand: New. pp. xxviii + 308.
Sprache: Englisch
Verlag: VDM Verlag Dr. Mueller Aktiengesellschaft & Co. KG, 2013
ISBN 10: 3659365041 ISBN 13: 9783659365041
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Verlag: LAP LAMBERT Academic Publishing, 2012
ISBN 10: 3659148814 ISBN 13: 9783659148811
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Taschenbuch. Zustand: Neu. Electron Free Plasma : From Being to Becoming | Manoj Kumar Deka | Taschenbuch | 84 S. | Englisch | 2013 | LAP LAMBERT Academic Publishing | EAN 9783659365041 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.
Sprache: Englisch
Verlag: LAP Lambert Academic Publishing, 2012
ISBN 10: 3659148814 ISBN 13: 9783659148811
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Taschenbuch. Zustand: Neu. Ion acoustic solitary wave in an ion beam driven dusty plasma | From Theory to Experiment | Manoj Kumar Deka (u. a.) | Taschenbuch | Englisch | LAP Lambert Academic Publishing | EAN 9783659148811 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.
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Verlag: LAP LAMBERT Academic Publishing, 2012
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Sprache: Englisch
Verlag: LAP LAMBERT Academic Publishing Nov 2013, 2013
ISBN 10: 3659365041 ISBN 13: 9783659365041
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Taschenbuch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Electronegative plasmas produced by attaching mobile low energy electrons to create heavy negative ions are very attractive for both fundamental research and plasma processing applications. Electronegative gas plasmas are widely used in microelectronics manufacturing for etching and deposition of thin films. For example, plasmas in gases containing Cl2 or SF6 are used for silicon etching, fluorocarbon plasmas are indispensable for silicon dioxide etching, and oxygen plasmas are used for ashing of photoresist and other polymers. Electronegative plasmas produced in argon and sulfur hexafluoride (SF6) are used to etch silicon, silicon nitride, silicon carbide and titanium carbide with high etch rates and without film residues. Highly electronegative discharges, also called ion-ion plasmas are seen as a promising solution for electric propulsion and neutral beam development. Ion-ion plasmas find application in charge-free semiconductor manufacturing, negative ion sources, and the D-layer of the upper atmosphere. .Here based on CUSP type magntic filter, a source of an almost electron free plasma along with all possible mechanism of negative ion production is discussed. 84 pp. Englisch.
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Verlag: VDM Verlag Dr. Mueller Aktiengesellschaft & Co. KG, 2013
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ISBN 10: 3659365041 ISBN 13: 9783659365041
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In den WarenkorbZustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Deka Manoj KumarManoj Kumar Deka completed his Ph.D. from Gauhati University in the year 2013 in experimental dusty plasma physics.He started his carrier as a Junior Research Fellow in the Plasma Physics Division in Institute of Adva.
Sprache: Englisch
Verlag: LAP LAMBERT Academic Publishing, 2012
ISBN 10: 3659148814 ISBN 13: 9783659148811
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In den WarenkorbZustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Deka Manoj KumarManoj Kumar Deka did his M.Sc. from Tezpur University and is heading towards Ph.D. from Gauhati University.He started his carrier as a Junior Research Fellow in the Plasma Physics Division in Institute of Advanced Stu.
Sprache: Englisch
Verlag: LAP LAMBERT Academic Publishing Nov 2013, 2013
ISBN 10: 3659365041 ISBN 13: 9783659365041
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Taschenbuch. Zustand: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Electronegative plasmas produced by attaching mobile low energy electrons to create heavy negative ions are very attractive for both fundamental research and plasma processing applications. Electronegative gas plasmas are widely used in microelectronics manufacturing for etching and deposition of thin films. For example, plasmas in gases containing Cl2 or SF6 are used for silicon etching, fluorocarbon plasmas are indispensable for silicon dioxide etching, and oxygen plasmas are used for ashing of photoresist and other polymers. Electronegative plasmas produced in argon and sulfur hexafluoride (SF6) are used to etch silicon, silicon nitride, silicon carbide and titanium carbide with high etch rates and without film residues. Highly electronegative discharges, also called ion¿ion plasmas are seen as a promising solution for electric propulsion and neutral beam development. Ion¿ion plasmas find application in charge-free semiconductor manufacturing, negative ion sources, and the D-layer of the upper atmosphere. .Here based on CUSP type magntic filter, a source of an almost electron free plasma along with all possible mechanism of negative ion production is discussed.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 84 pp. Englisch.
Sprache: Englisch
Verlag: LAP LAMBERT Academic Publishing, 2013
ISBN 10: 3659365041 ISBN 13: 9783659365041
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Electronegative plasmas produced by attaching mobile low energy electrons to create heavy negative ions are very attractive for both fundamental research and plasma processing applications. Electronegative gas plasmas are widely used in microelectronics manufacturing for etching and deposition of thin films. For example, plasmas in gases containing Cl2 or SF6 are used for silicon etching, fluorocarbon plasmas are indispensable for silicon dioxide etching, and oxygen plasmas are used for ashing of photoresist and other polymers. Electronegative plasmas produced in argon and sulfur hexafluoride (SF6) are used to etch silicon, silicon nitride, silicon carbide and titanium carbide with high etch rates and without film residues. Highly electronegative discharges, also called ion-ion plasmas are seen as a promising solution for electric propulsion and neutral beam development. Ion-ion plasmas find application in charge-free semiconductor manufacturing, negative ion sources, and the D-layer of the upper atmosphere. .Here based on CUSP type magntic filter, a source of an almost electron free plasma along with all possible mechanism of negative ion production is discussed.
Sprache: Englisch
Verlag: LAP Lambert Academic Publishing, 2012
ISBN 10: 3659148814 ISBN 13: 9783659148811
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Low temperature plasmas containing massive charged dusts have attracted a considerable attention over the last few decades. Such plasmas are relevant in astrophysical settings, such as formation of stars in interstellar clouds or physical processes in cometary tails and planetary magnetospheres as well as in industrial plasmas, e.g., semiconductor processing etc. The presence of these charged dusts in electron-ion plasmas modifies the propagation of dust ion-acoustic wave (DIAWs) or dust-acoustic wave (DAWs). On the other hand, it is seen that energetic charged particles such as ion beam can significantly modify the propagation characteristics of solitary waves in plasmas. Also, it has been observed that the propagation of high current finite length ion beam in the background plasma plays a significant role in many applications, e.g., heavy-ion fusion, plasma lenses, cosmic ray propagation etc . Here based on plasma fluid theory as well as along with experimental demonstrations, all the different features of ion acoustic solitary waves in an ion beam driven dusty plasma are discussed in detail keeping in view of basic as well as applied plasma physics.
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In den WarenkorbPAP. Zustand: New. New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
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