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Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book introduces readers to the physics governing electron emission under high voltages and temperatures, and highlights recent modeling and numerical developments for describing these phenomena.It begins with a brief introduction, presenting several applications that have driven electron emission research in the last few decades. The authors summarize the most relevant theories including the physics of thermo-field electron emission and the main characteristic parameters. Based on these theories, they subsequently describe numerical multi-physics models and discuss the main findings on the effect of space charges, emitter geometry, pulse duration, etc.Beyond the well-known photoelectric effect, the book reviews recent advanced theories on photon-metal interaction. Distinct phenomena occur when picosecond and femtosecond lasers are used to irradiate a surface. Their consequences on metal electron dynamics and heating are presented and discussed, leading to various emission regimes - in and out of equilibrium. In closing, the book reviews the effects of electron emission on high-voltage operation in vacuum, especially breakdown and conditioning, as the most common examples.The book offers a uniquely valuable resource for graduate and PhD students whose work involves electron emission, high-voltage holding, laser irradiation of surfaces, vacuum or discharge breakdown, but also for academic researchers and professionals in the field of accelerators and solid state physics with an interest in this highly topical area.…

Buch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book introduces readers to the physics governing electron emission under high voltages and temperatures, and highlights recent modeling and numerical developments for describing these phenomena.It begins with a brief introduction, presenting several applications that have driven electron emission research in the last few decades. The authors summarize the most relevant theories including the physics of thermo-field electron emission and the main characteristic parameters. Based on these theories, they subsequently describe numerical multi-physics models and discuss the main findings on the effect of space charges, emitter geometry, pulse duration, etc.Beyond the well-known photoelectric effect, the book reviews recent advanced theories on photon-metal interaction. Distinct phenomena occur when picosecond and femtosecond lasers are used to irradiate a surface. Their consequences on metal electron dynamics and heating are presented and discussed, leading to various emission regimes - in and out of equilibrium. In closing, the book reviews the effects of electron emission on high-voltage operation in vacuum, especially breakdown and conditioning, as the most common examples.The book offers a uniquely valuable resource for graduate and PhD students whose work involves electron emission, high-voltage holding, laser irradiation of surfaces, vacuum or discharge breakdown, but also for academic researchers and professionals in the field of accelerators and solid state physics with an interest in this highly topical area.…

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Taschenbuch. Zustand: Neu. High Power Impulse Magnetron Sputtering | Fundamentals, Technologies, Challenges and Applications | Daniel Lundin (u. a.) | Taschenbuch | Einband - flex.(Paperback) | Englisch | 2019 | Elsevier Inc | EAN 9780128124543 | Verantwortliche Person für die EU: Elsevier B.V., Radarweg 29, 1043 NX AMSTERDAM, NIEDERLANDE, productsafety[at]elsevier[dot]com | Anbieter: preigu. …

Paperback. Zustand: Brand New. 230 pages. 9.25x6.10x0.49 inches. In Stock.

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Paperback. Zustand: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.…

Zustand: New. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its.

Paperback. Zustand: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.…

Taschenbuch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Englisch.…

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Taschenbuch. Zustand: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.…