Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: BMV Bloor, Toronto, ON, Kanada
Zustand: Very Good. Used - Very Good.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: booksXpress, Bayonne, NJ, USA
Soft Cover. Zustand: new. This item is printed on demand.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: Lucky's Textbooks, Dallas, TX, USA
Zustand: New.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: GreatBookPrices, Columbia, MD, USA
Zustand: New.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: GreatBookPrices, Columbia, MD, USA
Zustand: As New. Unread book in perfect condition.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
Zustand: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: Revaluation Books, Exeter, Vereinigtes Königreich
Paperback. Zustand: Brand New. 2014 edition. 40 pages. 8.75x6.00x0.25 inches. In Stock.
Verlag: Springer Japan Feb 2014, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Deutschland
Taschenbuch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described. 52 pp. Englisch.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: GreatBookPricesUK, Castle Donington, DERBY, Vereinigtes Königreich
Zustand: New.
Verlag: Springer, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: GreatBookPricesUK, Castle Donington, DERBY, Vereinigtes Königreich
Zustand: As New. Unread book in perfect condition.
Verlag: Springer Japan, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: AHA-BUCH GmbH, Einbeck, Deutschland
Taschenbuch. Zustand: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
Verlag: Springer Japan, 2014
ISBN 10: 4431547940 ISBN 13: 9784431547945
Anbieter: moluna, Greven, Deutschland
Kartoniert / Broschiert. Zustand: New.