High gate dielectrics (47 Ergebnisse)

Paperback. Zustand: New.

Zustand: Like New. Most items will be dispatched the same or the next working day. An apparently unread copy in perfect condition. Dust cover is intact with no nicks or tears. Spine has no signs of creasing. Pages are clean and not marred by notes or folds of any kind.

Zustand: New. pp. 64.

Zustand: New.

Paperback. Zustand: New.

Zustand: New. In English.

Hardcover. Zustand: Very Good. No Jacket. 1st Edition. Published by IOP Publishing Ltd in 2004, here is the first hardback printing of High K Gate Dielectrics (Materials Science and Engineering Series)edited by M.Houssa. Orange boards, 601 illustrated pages the book is in very good condition with some light fading to the spine. The book is very heavy and therefore additional postage MUST be applied to areas OUTSIDE the UK as follows: Europe £6, Rest of the World £9. UK postage is as quoted and will be tracked for this item.…

Zustand: As New. Unread book in perfect condition.

Zustand: New. pp. 614.

Zustand: New.

Taschenbuch. Zustand: Neu. Surface potential of Dual Material Gate MOSFET with high-k dielectrics | Short Channel Effects in MOSFET | Swapnadip De | Taschenbuch | 64 S. | Englisch | 2013 | LAP LAMBERT Academic Publishing | EAN 9783659421228 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu. …

Zustand: New.

Paperback / softback. Zustand: New. New copy - Usually dispatched within 4 working days.

Zustand: As New. Unread book in perfect condition.

Zustand: New. pp. 614.

Zustand: New. pp. 614.

Taschenbuch. Zustand: Neu. Development and properties of Zirconia and Titania Derived Materials | for High-K Gate Dielectrics | Sandeep K | Taschenbuch | Englisch | 2019 | LAP LAMBERT Academic Publishing | EAN 9786200483133 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.…

Taschenbuch. Zustand: Neu. Gate Stacks with High-k Dielectrics and Metal Electrodes | Fermi Level Pinning and Dipoles Induced by Lanthanide Oxides | Manhong Zhang | Taschenbuch | Einband - flex.(Paperback) | Englisch | 2009 | VDM Verlag Dr. Müller | EAN 9783639150681 | Verantwortliche Person für die EU: OmniScriptum GmbH & Co. KG, Bahnhofstr. 28, 66111 Saarbrücken, info[at]akademikerverlag[dot]de | Anbieter: preigu.…

Zustand: Hervorragend. Zustand: Hervorragend | Sprache: Englisch | Produktart: Bücher | The semiconductor industry is in search of new materials that will aid in the miniaturization of electronic devices. High - k dielectrics will greatly reduce gate leakage current in CMOS circuit and will enable future low power processors. (Ba/Sr/Ca/Zn/Mg) Titanates and Zirconates are systems with high dielectric constant and low loss. They have many applications in the field of microwave electronics. Different compositions of titanates and zirconates are prepared by a modified combustion method. The prepared materials are characterized by X-ray Diffraction (XRD) method, transmission electron microscopy (TEM), scanning electron microscopy (SEM) and vibrational spectroscopy. The band gap of the developed materials is determined using UV- Vis spectrophotometer. The photoluminescent properties are studied using a spectrophotometer. The dielectric properties are measured using an LCR meter.…

Taschenbuch. Zustand: Neu. Nitrogen incorporation into high-k gate dielectrics | Evaluation of nitrogen incorporation effects in HfO2 and HfSiO gate dielectrics for improved MOSFET performance | Hag-Ju Cho | Taschenbuch | Englisch | VDM Verlag Dr. Müller | EAN 9783639157055 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.…

Taschenbuch. Zustand: Neu. High-k Gate Dielectrics and Diffusion Barriers in Cu Metallization | Materials, Growth and Performance | Prodyut Majumder | Taschenbuch | Englisch | LAP Lambert Academic Publishing | EAN 9783659134364 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.…

Zustand: Wie neu. 25 x 17,5 cm. 590 Seiten. ISBN 9783527330324 Sprache: Englisch Gewicht in Gramm: 1500 Pappband (noch originalverschweißt).

Paperback. Zustand: New.

Taschenbuch. Zustand: Neu. High-k Dielectrics and Metal Gates for Memory Applications | Investigation of High-k Dielectrics and Metal Gate Electrodes for Floating Gate Non-Volatile Memory Applications | Srikant Jayanti | Taschenbuch | 252 S. | Englisch | 2012 | LAP LAMBERT Academic Publishing | EAN 9783846588475 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.…

Zustand: New. Michel Houssa Laboratoire Materiaux et Microelectronique de Provence, Universite de Provence, France Silicon Processing and Device Technology Division, IMEC, BelgiumThe drive toward smaller and smaller electronic componentry has huge implications.

Paperback. Zustand: Brand New. 614 pages. 9.21x6.14x1.34 inches. In Stock.

Taschenbuch. Zustand: Neu. Neuware - The drive toward smaller and smaller electronic componentry of microelectronics is demanding new materials with higher electrical permittivity. An impressive collection of methods with in-depth coverage, High k Gate Dielectrics reviews the state-of-the-art in high permittivity gate dielectric research. Leading researchers from Europe and the USA de.…

Paperback. Zustand: Brand New. 252 pages. 8.66x5.91x0.57 inches. In Stock.

Paperback. Zustand: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Paperback. Zustand: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.