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Zustand: Very Good. hardcover, 306 pp., ex library, but text and binding still clean and tight . - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.
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Verlag: Institute of Physics, 1998
Anbieter: Peace of Mind Bookstore, Tulsa, OK, USA
Hardcover. Zustand: Very Good. Professional book dealer with storefront since 1975. All orders are processed promptly and carefully packaged. ; 524 pages.
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paperback. Zustand: New. Language:Chinese.Paperback. Pub Date: 2024-02 Pages: 191 Publisher: Wuhan University Press This book addresses the practical problems and needs encountered in the radiographic inspection of welds in important fields such as nuclear power. chemical industry. and shipbuilding. Using digitized radiographic images of weld seams as the research object. it solves problems such as automatic defect identification. image enhancement based on human vision. digital storage and retrieval of radiographic .
Zustand: Good. 320 pp., hardcover, ex library else text clean and binding tight. - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country. Photos available upon request.
Anbieter: GreatBookPricesUK, Woodford Green, Vereinigtes Königreich
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Anbieter: Books Puddle, New York, NY, USA
Zustand: New. pp. 548.
Anbieter: Ria Christie Collections, Uxbridge, Vereinigtes Königreich
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Anbieter: Biblios, Frankfurt am main, HESSE, Deutschland
Zustand: New. pp. 548.
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In den WarenkorbHardcover. Zustand: Brand New. 1st edition. 524 pages. 9.75x6.50x1.25 inches. In Stock.
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In den WarenkorbGebunden. Zustand: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Doneker, J.Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This .
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Anbieter: PBShop.store US, Wood Dale, IL, USA
HRD. Zustand: New. New Book. Shipped from UK. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
Buch. Zustand: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This volume addresses advances in defect analyzing techniques and instrumentation and their application to substrates, epilayers, and devices. The book discusses the merits and limits of characterization techniques; standardization; correlations between defects and device performance, including degradation and failure analysis; and the adaptation and application of standard characterization techniques to new materials. It also examines the impressive advances made possible by the increase in the number of nanoscale scanning techniques now available. The book investigates defects in layers and devices, and examines the problems that have arisen in characterizing gallium nitride and silicon carbide.