Verlag: Woodhead Publishing Ltd 2015-08-03, 2015
ISBN 10: 0081002505 ISBN 13: 9780081002506
Sprache: Englisch
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In den WarenkorbHardcover. Zustand: New.
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In den WarenkorbZustand: New. pp. 646.
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In den WarenkorbHardcover. Zustand: Brand New. 1st edition. 328 pages. 9.00x6.25x0.75 inches. In Stock.
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In den WarenkorbZustand: New. pp. 646.
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In den WarenkorbZustand: New. In.
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In den WarenkorbZustand: New. pp. 646.
Verlag: Elsevier Science Aug 2015, 2015
ISBN 10: 0081002505 ISBN 13: 9780081002506
Sprache: Englisch
Anbieter: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Deutschland
EUR 165,00
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In den WarenkorbBuch. Zustand: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. 328 pp. Englisch.
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In den WarenkorbBuch. Zustand: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
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In den WarenkorbZustand: new. Questo è un articolo print on demand.